Ultra-high resolution of 512×512 (262144) phase points, achieving high-precision wavefront measurement in the 900nm to 1200nm band, which can be used for optical system aberration measurement, optical system calibration, material internal lattice distribution measurement, metasurface, superlens wavefront measurement, etc.
FIS4-NIR near-infrared four-wave interferometer sensor combines the patented random coded four-wave diffraction technology with an infrared camera, and interferes at the rear image plane position. It has low requirements on the coherence of the light source and does not require phase shifting. Ordinary imaging systems can achieve interferometric measurement. It has ultra-high vibration resistance and ultra-high stability, and can achieve nm-level precision measurement without vibration isolation.
Main features
◆ Ultra-high resolution of 512×512 (262144) phase points
◆ Single-path light self-interference, no reference light required
◆ Wide spectrum 900nm~1200nm band
◆ 2nm RMS high phase resolution
◆ Large dynamic range up to 270μm
◆ Extremely strong vibration resistance, no need for optical vibration isolation
◆ Simple and fast optical path construction like imaging
◆ Support collimated beams and large NA converging beams
Product applications
Optical system aberration measurement, optical system calibration, material internal lattice distribution measurement, metasurface, superlens wavefront measurement.
