Specially developed for wavefront analysis in high-speed industrial, defense and scientific research scenarios such as flying shots and flow fields, it has an ultra-high resolution of 420×420 (176400) phase points, a wide spectrum response of 400-1100nm, and 107 frames of high-speed sampling, providing an ideal wavefront sensing measurement tool for wafer surface roughness detection, silicon-based and glass substrate micro-morphology measurement, aerodynamic optics, high-speed flow field, gas plasma density measurement, etc.
FIS4-HS ultra-high-speed four-wave interference sensor combines the patented random coded four-wave diffraction technology with a high-speed camera, and interferes at the rear image plane position. It has low requirements for light source coherence and does not require phase shifting. Ordinary imaging systems can achieve interference measurement. It has ultra-high vibration resistance, ultra-high stability, and ultra-high-speed imaging. It can achieve nm-level precision measurement without vibration isolation.
Main features
◆ Ultra-high resolution of 420×420 (176400) phase points
◆ Sampling frame rate up to 107fps
◆ Single-path light self-interference, no reference light required
◆ Wide spectrum 400nm~1100nm band
◆ 2nm RMS high phase resolution
◆ Extremely strong vibration resistance, no need for optical vibration isolation
◆ Simple and fast optical path construction like imaging
◆ Support collimated beam, large NA converging beam
Product application
Wafer surface roughness detection, silicon-based, glass substrate micro-morphology measurement, aerodynamic optics, high-speed flow field, gas plasma density measurement.
